Uni-Con - ユニバーサル半導体アプリケーション用コメットコンデンサ
3月 30, 2024
真空コンデンサーの機能は不変ですが、その特性は進化するニーズに対応するために適合させることができます。コメット社のUni-Conはその典型的な例です:長年にわたり、それは絶えず変化する顧客の要求を解決する様々な他の製品ファミリーに成長してきた。
Uni-Con is Comet’s universal vacuum capacitor for many applications. Originally a technical enhancement of the Basic-Con series, it now serves as the basis for many other vacuum capacitor solutions, all of which solve specific semiconductor industry needs.
For decades, Comet vacuum capacitors were mainly used for broadcast applications. That changed when Comet entered the semiconductor market in the late 1990s with its fixed Mini-Cap capacitors. It wasn’t long before the designers of impedance matching networks were requesting more and more often also variable vacuum capacitors that could be intentionally and repeatedly changed.
The existing variable Basic-Con product series fulfilled some of these requirements. When Comet engineers improved the design with a better connection concept and a more durable progressive bellows for prolonged life, the Uni-Con product family was born. To this day, variable capacitors from the Uni-Con series are the products most often built into matchboxes.
As the name suggests, Uni-Con is a universal solution for many semiconductor applications. Over the years, we’ve developed additional products to meet the needs of the increasingly complex semiconductor manufacturing process:
Basic-Con |
Basic design for various semiconductor applications. |
Uni-Select |
Designed for low power and general industrial applications. |
Uni-Con |
The universal capacitor for typical semiconductor applications. |
Hexa-Con |
High frequency for high power semiconductor applications, especially durable material. |
Tetra-Con |
High capacitance and high voltage vacuum capacitor. Covers applications where Hexa-Con has the wrong properties and Maxi-Con is too large. |
Comet has developed advanced technologies to enhance the performance of our proven vacuum capacitor series for specific semiconductor industry needs, including the following:
Increases the voltage of low frequency vacuum capacitors for high power density and increased design flexibility for the RF match architecture.
An extended-life drive system that increases reliability and useful lifetime.
Empowering new technologies
We pride ourselves on understanding and meeting customer needs. Supporting match designers with the right components to manufacture the latest generation of semiconductors has always been an important goal. The rising complexity of our customers’ requests continually drives our vacuum capacitor product range to the next level.
Vacuum capacitors solve one universal problem: storing electrical charges. The interesting challenge for our experienced engineers is adapting material and manufacturing processes in new and innovative ways within the limits of fixed physical laws and so enable new developments.
Successful Comet concepts and products, such as those we’ve discussed above, wouldn’t be possible without direct, deep collaboration with customers. Our engineers co-create directly with customer engineers and capture needs one-on-one, whether they relate to the planned plasma process or the matchbox hardware that defines the space for vacuum capacitors. We always welcome this collaboration and look forward to solving new challenges together with our customers.
Product recommendations for semiconductor applications
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Comet Plasma Control Technologies
最新の投稿
2026年2月11日~13日、Seoul, South Korea
1月 13, 2026
Semicon Koreaで新しい技術を体験しましょう!当社のRF電力システム製品をフルラインナップで、ホールC:3、ブース番号:B920にて展示いたします。 かつてない電力制御を可能にする、Cometの統合型RFパワーデリバリープラットフォームSynertia®をぜひ体感してください。
もっと見るDecember 17-19, 2025 in Tokyo, Japan
11月 18, 2025
プラズマ制御のエキスパートが、RFジェネレーター、RFマッチボックス、真空コンデンサをシームレスに統合し、プラズマプロセスをリアルタイムで把握できる強力なRFデリバリープラットフォームSynertia®のデモンストレーションにご招待いたします。
もっと見るNovember 18-21, 2025 in Munich, Germany
10月 07, 2025
Our plasma control experts are pleased to invite you to a demonstration of Synertia®, the RF Delivery Platform that seamlessly integrates the RF Generator, RF Matchbox, and Vacuum Capacitors to provide real-time insights into plasma processes
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