Powerful command and control of plasma conditions at highest speed.

As semiconductor manufacturers extend device features from nanometer scale to angstrom and enable new 3D architectures to advance device performance and density, critical plasma processes require more sophisticated and accurate control of RF power delivery.

Synertia® provides unparalleled impedance matching for complex pulsing profiles and multiple pulse states enabling customization of the plasma conditions to achieve best on-wafer results while providing leading class accuracy and repeatability.

Synertia® is described as

1 + 1 = 3

The Synertia® RF Power Delivery Platform enables precise optimization at each process transition within continuous wave, pulsed, and multi-level pulsed waveforms to customize the plasma conditions for the best
on-wafer results and provides class leading accuracy and repeatability to meet the needs of volume manufacturing for the next nodes and beyond.

The Synertia® platform further enables greater synergy between RF Generator and RF Matching Networks with ultrafast communication and coordination, strong capabilities for data capture and on-board analysis for actionable insights to enable more complex plasma applications than have ever been possible before: a new level of deep control.

The Synertia® platform consists of RF Generators and RF Matching Networks with a wide range of frequencies and power levels.