The future of plasma control.

Powerful command and control of plasma conditions at highest speed.

Synertia® is Comet's new integrated RF Power Delivery Platform that enables unprecedented power control. A system that allows to manage the complexities of multi-layer next-generation memory and atomic-scale plasma processes. Disruptive process technology in the plasma chamber, enabled by Comet's RF power sub-systems, makes wafer processing tools ready for the workloads of the future.

 

Synertia® is described as

1 + 1 = 3

Synertia® is the powerful synergy between RF Generator and RF Matching Networks. In Synertia® the unique, patented controls of Generator and Match interact at highest possible speeds. These actionable insights enable more complex plasma applications than have ever been possible before.

The Synertia® platform consists of RF Generators and RF Matching Networks with a wide range of frequencies and power levels.

Synertia® RFG

Synertia® RF Generator

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Synertia® RFM

Synertia® RF Matching Network

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Synertia® RF Power Delivery Platform

Synertia® RFG

Unique performance accelerators

Users fully control the unique performance accelerators of Synertia® RFG, including repeatability, multi-level pulsing and high-speed communication. This responsiveness provides actionable insights and enables more complex plasma applications than have ever been possible before: a new level of deep control. Thus, higher yield is the result of Synertia®'s fast and agile process control, which delivers superior repatability, faster tuning, and custom wave-shaping.

13.56 MHz Synertia® RF Generators

Synertia® RFG 15/13

1.5 kW / 13.56 MHz

Synertia® RFG 25/13

2.5 kW / 13.56 MHz

Synertia® RFG 50/13

5 kW / 13.56 MHz

Features

  • Power accuracy and repeatability
  • Multi-level pulsing (four user definable levels)
  • Customizable frequency tuning
  • Digital metrology and intuitive graphical user interface
  • Digital system control for advanced manufacturing technologies

Benefits

  • Seamless integration into process systems
  • Ultra-fast plasma process control
  • Tighter repeatability delivers improved yield
  • Fast configurable rise/fall time of pulsing
  • Consistent process and wafer level uniformity

Technical data

  Synertia® 15/13 Synertia® 50/13
Frequency 13.56 MHz 13.56 MHz
Output power 1.5 W to 1500 W 5 W to 5000 W
RF accuracy into 50 Ω

± 1 % of setpoint
or ± 0.3 W
whichever is greater

± 1 % of setpoint
or ± 1 W
whichever is greater

Pulse rate 0.05 Hz to 100 kHz
Pulse rise / fall time 300/240 ns 600/240 ns
CEX

400 kHz to 110 MHz

Frequency tuning Within ± 10 % of nominal frequency
Interfaces

EtherCAT®, RS232, RS485, analog
(ProfiNet®, DeviceNet® etc.)

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Synertia® RF Power Delivery Platform

Synertia® RFM

Built for speed, accuracy, precision and repeatability.

The Synertia® RFM works in powerful synergy with the Synertia® RFG. Precise sensors and an enhanced tuning algorithm in the matching network ensure consistent and stable plasma processes.

Features

  • Precise and repeatable input/output sensors
  • Advanced multi-level pulsing with the ability to set custom tuning parameters
  • Ability to work with a combination of various tuning elements
  • Onboard monitoring and diagnostics to assist with preventive maintenance
  • Ultra wide-band sensors

Benefits

  • Continuous process improvement via real time signal processing and data collection
  • Superior process control and repeatability with fully digital and customizable controls
  • Consistent, stable RF plasma with enhanced tuning algorithm
  • Reduced total cost of ownership with improved MTBF and enhanced reliability
  • Robust design with RF expertise, state-of-the-art modeling/virtual prototyping and extensive library of RF tuning circuits

Technical data

Frequencies 400 kHz - 100 MHz
Input power 600 W to 20 kW
Output V/l

max. current (~150 ARMS),
max. voltage (10 kVpeak)

Pulsing Single, dual and multi-level
User interface

EtherCAT®, RS232, analog, advanced user interface
(ProfiNet® and DeviceNet® coming soon)

Optional sensor capabilities Vpp, Vdc and others

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