Designed for highest stability into dynamic

cito Plus offers superior pulsing quality, stability and power measurement accuracy, making it the best choice for plasma deposition and etch applications, as well as for non-semiconductor applications.

  • High up time - focus on throughput and lower operating costs
  • Value in accuracy, repeatability and stability - meet your process requirements
  • Higher power efficiency - better economics and environmental friendly footprint


  • Symmetrical open loop response
  • High accuracy power control
  • Pulsing up to 100 kHz
  • CEX with variable phase delay
  • CEX output frequency divider
  • SEMI compliant


  • Predictable plasma behavior
  • Easy system integration
  • Repeatable wafer results
  • Stable with any cable length
  • Superior pulse shape into any load
  • Worldwide compatibility with most production equipment

Load power into 3:1 VSWR

Symmetrical open loop response

Consider cito Plus for upgrades and replacements

  • Better stability over what is on the tools now
  • Can be used for Bias and source

The Plug & Play system offers you

  • Available interfaces: Analog, RS-232C, Ethernet, Profibus, Matching network control
  • Coaxial cable insensitivity – no need to adjust for length – keep the same cables
  • Air-cooled, no cooling lines
  • Easy user friendly front panel control or passive panel
  • AC input large range covered 230 V AC nominal, single phase


Synertia RF Generator


Matched performance